WFIRST-AFTA coronagraph shaped pupil masks: Design, fabrication, and characterization

NASA WFIRST-AFTA mission study includes a coronagraph instrument to find and characterize exoplanets. Various types of masks could be employed to suppress the host starlight to about 10-9 level contrast over a broad spectrum to enable the coronagraph mission objectives. Such masks for high-contrast internal coronagraphic imaging require various fabrication technologies to meet a wide range of specifications, including precise shapes, micron scale island features, ultralow reflectivity regions, uniformity, wave front quality, and achromaticity. We present the approaches employed at JPL to produce pupil plane and image plane coronagraph masks by combining electron beam, deep reactive ion etching, and black silicon technologies with illustrative examples of each, highlighting milestone accomplishments from the High Contrast Imaging Testbed at JPL and from the High Contrast Imaging Lab at Princeton University.