TY - JOUR
T1 - WFIRST-AFTA coronagraph shaped pupil masks
T2 - Design, fabrication, and characterization
AU - Balasubramanian, Kunjithapatham
AU - White, Victor
AU - Yee, Karl
AU - Echternach, Pierre
AU - Muller, Richard
AU - Dickie, Matthew
AU - Cady, Eric
AU - Prada, Camilo Mejia
AU - Ryan, Daniel
AU - Poberezhskiy, Ilya
AU - Kern, Brian
AU - Zhou, Hanying
AU - Krist, John
AU - Nemati, Bijan
AU - Eldorado Riggs, A. J.
AU - Zimmerman, Neil T.
AU - Kasdin, N. Jeremy
N1 - Publisher Copyright:
© 2015 Society of Photo-Optical Instrumentation Engineers (SPIE).
PY - 2016/1/1
Y1 - 2016/1/1
N2 - NASA WFIRST-AFTA mission study includes a coronagraph instrument to find and characterize exoplanets. Various types of masks could be employed to suppress the host starlight to about 10-9 level contrast over a broad spectrum to enable the coronagraph mission objectives. Such masks for high-contrast internal coronagraphic imaging require various fabrication technologies to meet a wide range of specifications, including precise shapes, micron scale island features, ultralow reflectivity regions, uniformity, wave front quality, and achromaticity. We present the approaches employed at JPL to produce pupil plane and image plane coronagraph masks by combining electron beam, deep reactive ion etching, and black silicon technologies with illustrative examples of each, highlighting milestone accomplishments from the High Contrast Imaging Testbed at JPL and from the High Contrast Imaging Lab at Princeton University.
AB - NASA WFIRST-AFTA mission study includes a coronagraph instrument to find and characterize exoplanets. Various types of masks could be employed to suppress the host starlight to about 10-9 level contrast over a broad spectrum to enable the coronagraph mission objectives. Such masks for high-contrast internal coronagraphic imaging require various fabrication technologies to meet a wide range of specifications, including precise shapes, micron scale island features, ultralow reflectivity regions, uniformity, wave front quality, and achromaticity. We present the approaches employed at JPL to produce pupil plane and image plane coronagraph masks by combining electron beam, deep reactive ion etching, and black silicon technologies with illustrative examples of each, highlighting milestone accomplishments from the High Contrast Imaging Testbed at JPL and from the High Contrast Imaging Lab at Princeton University.
KW - WFIRST-AFTA
KW - black silicon
KW - coronagraph
KW - exoplanet
KW - shaped pupil masks
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U2 - 10.1117/1.JATIS.2.1.011005
DO - 10.1117/1.JATIS.2.1.011005
M3 - Article
AN - SCOPUS:84946892904
SN - 2329-4124
VL - 2
JO - Journal of Astronomical Telescopes, Instruments, and Systems
JF - Journal of Astronomical Telescopes, Instruments, and Systems
IS - 1
M1 - 011005
ER -