TY - JOUR
T1 - Vertical displacements close to ideal-MHD marginal stability in tokamak plasmas
AU - Porcelli, F.
AU - Barberis, T.
AU - Yolbarsop, A.
N1 - Publisher Copyright:
© 2023 The Authors
PY - 2023/6
Y1 - 2023/6
N2 - Elongated tokamak plasmas are prone to instability, initiated by vertical displacement perturbations, which can be suppressed if a perfectly conductive wall is placed near the plasma boundary, providing passive feedback stabilization. For the more realistic case of a resistive wall, the vertical mode can still grow on the relatively slow resistive wall time scale. Active feedback control is then required for complete stabilization. However, the slow growth is far from ideal-MHD marginal stability on the stable side, i.e., provided that the wall is sufficiently close to the plasma. It is shown that the resistive growth rate can be significantly faster, scaling with fractional powers of wall resistivity, if the wall position satisfies the criterion for ideal-MHD marginal stability, thus posing more stringent conditions for active feedback stabilization.
AB - Elongated tokamak plasmas are prone to instability, initiated by vertical displacement perturbations, which can be suppressed if a perfectly conductive wall is placed near the plasma boundary, providing passive feedback stabilization. For the more realistic case of a resistive wall, the vertical mode can still grow on the relatively slow resistive wall time scale. Active feedback control is then required for complete stabilization. However, the slow growth is far from ideal-MHD marginal stability on the stable side, i.e., provided that the wall is sufficiently close to the plasma. It is shown that the resistive growth rate can be significantly faster, scaling with fractional powers of wall resistivity, if the wall position satisfies the criterion for ideal-MHD marginal stability, thus posing more stringent conditions for active feedback stabilization.
UR - https://www.scopus.com/pages/publications/85184993290
UR - https://www.scopus.com/inward/citedby.url?scp=85184993290&partnerID=8YFLogxK
U2 - 10.1016/j.fpp.2023.100017
DO - 10.1016/j.fpp.2023.100017
M3 - Article
AN - SCOPUS:85184993290
SN - 2772-8285
VL - 5
JO - Fundamental Plasma Physics
JF - Fundamental Plasma Physics
M1 - 100017
ER -