Abstract
The interaction of fluorine atoms and hydrogen atoms on the photoresist (PR) surface was studied by simplifying the complex surface chemistry of fluorocarbon plasmas. The chemistry was modeled in the vacuum beam interactions to understand the plasma-(PR) surface interactions. The argon ions and independent fluxes of neutral deuterium and fluorine atoms intersected at the photoresist sample. Etch yield of PR was high under these conditions. The experiment was done by reducing the fluorine to carbon ratio in the plasma and more specifically at the PR surface itself.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 2288-2294 |
| Number of pages | 7 |
| Journal | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
| Volume | 18 |
| Issue number | 5 |
| DOIs | |
| State | Published - Sep 2000 |
| Externally published | Yes |
| Event | 47th International Symposium: Vacuum, Thin Films, Surfaces/Interfaces, and Processing - Boston, USA Duration: Oct 2 2000 → Oct 6 2000 |
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films