Ultrahigh growth rate of epitaxial silicon by chemical vapor deposition at low temperature with neopentasilane

K. H. Chung, N. Yao, Jay Burton Benziger, James Christopher Sturm, K. K. Singh, D. Carlson, S. Kuppurao

Research output: Contribution to journal › Article › peer-review

34 Scopus citations

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Physics & Astronomy