Ultrafast patterning of nanostructures in polymers using laser assisted nanoimprint lithography

Qiangfei Xia, Chris Keimel, Haixiong Ge, Zhaoning Yu, Wei Wu, Stephen Y. Chou

Research output: Contribution to journalArticlepeer-review

61 Scopus citations

Abstract

An overview is given of a nanopatterning technique, laser-assisted nanoimprint lithography (LAN), which combines the advantages of traditional thermal-based NIL and laser-assisted direct imprint. It is demonstrated that LAN is capable of producing nanostructures in various polymers on different substrates by using only one excimer laser pulse an that the entire process from melting the polymer to completion of imprint is less than 500 ns. Numerical simulation shows that there is negligible heating of the substrate and mold.

Original languageEnglish (US)
Pages (from-to)4417-4419
Number of pages3
JournalApplied Physics Letters
Volume83
Issue number21
DOIs
StatePublished - Nov 24 2003

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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