An overview is given of a nanopatterning technique, laser-assisted nanoimprint lithography (LAN), which combines the advantages of traditional thermal-based NIL and laser-assisted direct imprint. It is demonstrated that LAN is capable of producing nanostructures in various polymers on different substrates by using only one excimer laser pulse an that the entire process from melting the polymer to completion of imprint is less than 500 ns. Numerical simulation shows that there is negligible heating of the substrate and mold.
|Original language||English (US)|
|Number of pages||3|
|Journal||Applied Physics Letters|
|State||Published - Nov 24 2003|
All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)