Transport properties of ultra-thin VO2 films on (001) TiO2 grown by reactive molecular-beam epitaxy

Hanjong Paik; Jarrett A. Moyer; Timothy Spila; Joshua W. Tashman; Julia A. Mundy; Eugene Freeman; Nikhil Shukla; Jason M. Lapano; Roman Engel-Herbert; Willi Zander; Jürgen Schubert; David A. Muller; Suman Datta; Peter Schiffer; Darrell G. Schlom

doi:10.1063/1.4932123

Transport properties of ultra-thin VO₂ films on (001) TiO₂ grown by reactive molecular-beam epitaxy

Hanjong Paik, Jarrett A. Moyer, Timothy Spila, Joshua W. Tashman, Julia A. Mundy, Eugene Freeman, Nikhil Shukla, Jason M. Lapano, Roman Engel-Herbert, Willi Zander, Jürgen Schubert, David A. Muller, Suman Datta, Peter Schiffer, Darrell G. Schlom

Research output: Contribution to journal › Article › peer-review

91 Scopus citations

Abstract

We report the growth of (001)-oriented VO₂ films as thin as 1.5nm with abrupt and reproducible metal-insulator transitions (MIT) without a capping layer. Limitations to the growth of thinner films with sharp MITs are discussed, including the Volmer-Weber type growth mode due to the high energy of the (001) VO₂ surface. Another key limitation is interdiffusion with the (001) TiO₂ substrate, which we quantify using low angle annular dark field scanning transmission electron microscopy in conjunction with electron energy loss spectroscopy. We find that controlling island coalescence on the (001) surface and minimization of cation interdiffusion by using a low growth temperature followed by a brief anneal at higher temperature are crucial for realizing ultrathin VO₂ films with abrupt MIT behavior.

Original language	English (US)
Article number	163101
Journal	Applied Physics Letters
Volume	107
Issue number	16
DOIs	https://doi.org/10.1063/1.4932123
State	Published - Oct 19 2015
Externally published	Yes

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.4932123

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Paik, H., Moyer, J. A., Spila, T., Tashman, J. W., Mundy, J. A., Freeman, E., Shukla, N., Lapano, J. M., Engel-Herbert, R., Zander, W., Schubert, J., Muller, D. A., Datta, S., Schiffer, P., & Schlom, D. G. (2015). Transport properties of ultra-thin VO₂ films on (001) TiO₂ grown by reactive molecular-beam epitaxy. Applied Physics Letters, 107(16), Article 163101. https://doi.org/10.1063/1.4932123

@article{7748ad18ded14bf6a612e5aeafc48a3d,

title = "Transport properties of ultra-thin VO2 films on (001) TiO2 grown by reactive molecular-beam epitaxy",

abstract = "We report the growth of (001)-oriented VO2 films as thin as 1.5nm with abrupt and reproducible metal-insulator transitions (MIT) without a capping layer. Limitations to the growth of thinner films with sharp MITs are discussed, including the Volmer-Weber type growth mode due to the high energy of the (001) VO2 surface. Another key limitation is interdiffusion with the (001) TiO2 substrate, which we quantify using low angle annular dark field scanning transmission electron microscopy in conjunction with electron energy loss spectroscopy. We find that controlling island coalescence on the (001) surface and minimization of cation interdiffusion by using a low growth temperature followed by a brief anneal at higher temperature are crucial for realizing ultrathin VO2 films with abrupt MIT behavior.",

author = "Hanjong Paik and Moyer, {Jarrett A.} and Timothy Spila and Tashman, {Joshua W.} and Mundy, {Julia A.} and Eugene Freeman and Nikhil Shukla and Lapano, {Jason M.} and Roman Engel-Herbert and Willi Zander and J{\"u}rgen Schubert and Muller, {David A.} and Suman Datta and Peter Schiffer and Schlom, {Darrell G.}",

note = "Publisher Copyright: {\textcopyright} 2015 AIP Publishing LLC.",

year = "2015",

month = oct,

day = "19",

doi = "10.1063/1.4932123",

language = "English (US)",

volume = "107",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "16",

}

Paik, H, Moyer, JA, Spila, T, Tashman, JW, Mundy, JA, Freeman, E, Shukla, N, Lapano, JM, Engel-Herbert, R, Zander, W, Schubert, J, Muller, DA, Datta, S, Schiffer, P & Schlom, DG 2015, 'Transport properties of ultra-thin VO₂ films on (001) TiO₂ grown by reactive molecular-beam epitaxy', Applied Physics Letters, vol. 107, no. 16, 163101. https://doi.org/10.1063/1.4932123

TY - JOUR

T1 - Transport properties of ultra-thin VO2 films on (001) TiO2 grown by reactive molecular-beam epitaxy

AU - Paik, Hanjong

AU - Moyer, Jarrett A.

AU - Spila, Timothy

AU - Tashman, Joshua W.

AU - Mundy, Julia A.

AU - Freeman, Eugene

AU - Shukla, Nikhil

AU - Lapano, Jason M.

AU - Engel-Herbert, Roman

AU - Zander, Willi

AU - Schubert, Jürgen

AU - Muller, David A.

AU - Datta, Suman

AU - Schiffer, Peter

AU - Schlom, Darrell G.

PY - 2015/10/19

Y1 - 2015/10/19

N2 - We report the growth of (001)-oriented VO2 films as thin as 1.5nm with abrupt and reproducible metal-insulator transitions (MIT) without a capping layer. Limitations to the growth of thinner films with sharp MITs are discussed, including the Volmer-Weber type growth mode due to the high energy of the (001) VO2 surface. Another key limitation is interdiffusion with the (001) TiO2 substrate, which we quantify using low angle annular dark field scanning transmission electron microscopy in conjunction with electron energy loss spectroscopy. We find that controlling island coalescence on the (001) surface and minimization of cation interdiffusion by using a low growth temperature followed by a brief anneal at higher temperature are crucial for realizing ultrathin VO2 films with abrupt MIT behavior.

AB - We report the growth of (001)-oriented VO2 films as thin as 1.5nm with abrupt and reproducible metal-insulator transitions (MIT) without a capping layer. Limitations to the growth of thinner films with sharp MITs are discussed, including the Volmer-Weber type growth mode due to the high energy of the (001) VO2 surface. Another key limitation is interdiffusion with the (001) TiO2 substrate, which we quantify using low angle annular dark field scanning transmission electron microscopy in conjunction with electron energy loss spectroscopy. We find that controlling island coalescence on the (001) surface and minimization of cation interdiffusion by using a low growth temperature followed by a brief anneal at higher temperature are crucial for realizing ultrathin VO2 films with abrupt MIT behavior.

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JF - Applied Physics Letters

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ER -

Transport properties of ultra-thin VO₂ films on (001) TiO₂ grown by reactive molecular-beam epitaxy

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