GaInO3 is recently identified transparent conducting material which is structurally and chemically distinct from indium tin oxide [R. J. Cava, J. M. Phillips, J. Kwo, G. A. Thomas, R. B. van Dover, S. A. Carter, J. J. Krajewski, W. F. Peck, Jr., J. H. Marshall, and D. H. Rapkine, Appl. Phys. Lett. 64, 2071 (1994)]. We have used both dc reactive sputtering in the on- and off-axis geometries and pulsed laser deposition to grow films of this material. Layers of pure GaInO3 as well as those partially substituted with Ge for Ga or Sn for In have been studied. Both growth techniques are capable of producing films with conductivity ∼400 (Ω cm)-1 and transmission as high as 90% throughout the visible spectrum for ∼1-μm-thick films. The growth techniques differ in the morphology of the films produced as well as in the degree of dopant incorporation that can be achieved. A post-growth anneal in H2 can help produce an optimized oxygen content and a reduction of resistivity. Hall measurements indicate a carrier concentration up to 4×1020 cm-3 for all films and a Hall mobility up to 10 cm2/(V s). Doping appears to be due both to oxygen vacancies and aliovalent ion substitution.
All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)