Keyphrases
Topological Insulator
100%
Bismuth Telluride
100%
Metal-organic Chemical Vapor Deposition (MOCVD)
100%
Angle-resolved Photoemission Spectroscopy (ARPES)
40%
Topological Insulator Material
40%
Structural Properties
20%
Resistivity
20%
Diffraction
20%
Raman Spectroscopy
20%
Banded Structure
20%
Hall Effect Measurement
20%
Thermoelectric
20%
Seebeck Coefficient
20%
Electronic Properties
20%
Dirac Cone
20%
Carrier Mobility
20%
Device Application
20%
Topological Surface States
20%
Scalable Methods
20%
Bulk Carrier
20%
High-bulk
20%
GaAs(001)
20%
Electronic Transport Measurements
20%
Insulator-based
20%
Topological Insulator Thin Film
20%
Insulator Film
20%
(001) Substrate
20%
Engineering
Metal Organic Chemical Vapor Deposition
100%
Thin Films
66%
Photoemission
66%
Ray Diffraction
33%
Surface State
33%
Gallium Arsenide
33%
Band Structure
33%
Thermoelectrics
33%
Seebeck Coefficient
33%
Bulk Carrier
33%
Carrier Mobility
33%
Material Science
Film
100%
Metal-Organic Chemical Vapor Deposition
100%
Angle-Resolved Photoemission Spectroscopy
50%
Thin Films
50%
Gallium Arsenide
25%
Raman Spectroscopy
25%
Thermoelectrics
25%
Electrical Resistivity
25%
Electronic Property
25%
Electronic Band Structure
25%
Carrier Mobility
25%