Thermal stability of Si/Si1-x-yGexCy/Si quantum wells grown by rapid thermal chemical vapor deposition
- C. W. Liu
- , Y. D. Tseng
- , M. Y. Chern
- , C. L. Chang
- , J. C. Sturm
Research output: Contribution to journal › Article › peer-review
13
Link opens in a new tab
Scopus
citations