The surface electronic structure of silicon terminated (100) diamond

A. K. Schenk, A. Tadich, M. J. Sear, D. Qi, A. T.S. Wee, A. Stacey, C. I. Pakes

Research output: Contribution to journalArticlepeer-review

31 Scopus citations

Abstract

A combination of synchrotron-based x-ray spectroscopy and contact potential difference measurements have been used to examine the electronic structure of the (3 × 1) silicon terminated (100) diamond surface under ultra high vacuum conditions. An occupied surface state which sits 1.75 eV below the valence band maximum has been identified, and indications of mid-gap unoccupied surface states have been found. Additionally, the pristine silicon terminated surface is shown to possess a negative electron affinity of -0.86 ±0.1 eV.

Original languageEnglish (US)
Article number275201
JournalNanotechnology
Volume27
Issue number27
DOIs
StatePublished - May 23 2016
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • General Chemistry
  • General Materials Science
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

Keywords

  • ARPES
  • diamond
  • NV centres

Fingerprint

Dive into the research topics of 'The surface electronic structure of silicon terminated (100) diamond'. Together they form a unique fingerprint.

Cite this