The high growth rate of epitaxial silicon-carbon alloys by using chemical vapour deposition and neopentasilane

Keyphrases

• Chemical Vapor Deposition 100%
• Epitaxial Silicon 100%
• Alloy Layer 100%
• High Growth Rate 100%
• Substitutional Carbon 100%
• Silicon Carbon Alloys 100%
• Carbon Levels 100%
• Diffraction 50%
• Growth Rate 50%
• Silicon Substrate 50%
• Methylsilane 50%
• Carbon Source 50%
• Lattice Constant 50%
• Silicon-carbon 50%
• Si1-yCy 50%
• Source Gas 50%
• Epitaxy 50%
• Silicon Sources 50%
• Novel Precursor 50%

Engineering

• Chemical Vapor Deposition 100%
• Vapor Deposition 100%
• Alloy Layer 100%
• High Growth Rate 100%
• Carbon Alloy 100%
• Ray Diffraction 50%
• Silicon Substrate 50%
• Lattice Constant 50%
• Source Gas 50%

Material Science

• Silicon 100%
• Chemical Vapor Deposition 100%
• Epitaxy 25%
• Lattice Constant 25%