The adsorption-controlled growth of LuFe2O4 by molecular-beam epitaxy

  • Charles M. Brooks
  • , Rajiv Misra
  • , Julia A. Mundy
  • , Lei A. Zhang
  • , Brian S. Holinsworth
  • , Kenneth R. O'Neal
  • , Tassilo Heeg
  • , Willi Zander
  • , J. Schubert
  • , Janice L. Musfeldt
  • , Zi Kui Liu
  • , David A. Muller
  • , Peter Schiffer
  • , Darrell G. Schlom

Research output: Contribution to journalArticlepeer-review

Abstract

We report the growth of single-phase (0001)-oriented epitaxial films of the purported electronically driven multiferroic, LuFe2O4, on (111) MgAl2O4, (111) MgO, and (0001) 6H-SiC substrates. Film stoichiometry was regulated using an adsorption-controlled growth process by depositing LuFe2O4 in an iron-rich environment at pressures and temperatures where excess iron desorbs from the film surface during growth. Scanning transmission electron microscopy reveals reaction-free film-substrate interfaces. The magnetization increases rapidly below 240K, consistent with the paramagnetic-to-ferrimagnetic phase transition of bulk LuFe2O4. In addition to the ∼0.35eV indirect band gap, optical spectroscopy reveals a 3.4eV direct band gap at the gamma point.

Original languageEnglish (US)
Article number132907
JournalApplied Physics Letters
Volume101
Issue number13
DOIs
StatePublished - Sep 24 2012
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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