Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193 nm photoresist roughening and degradation

D. Nest; D. B. Graves; S. Engelmann; R. L. Bruce; F. Weilnboeck; G. S. Oehrlein; C. Andes; E. A. Hudson

doi:10.1063/1.2912028

Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193 nm photoresist roughening and degradation

D. Nest, D. B. Graves, S. Engelmann, R. L. Bruce, F. Weilnboeck, G. S. Oehrlein, C. Andes, E. A. Hudson

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Abstract

The roles of ultraviolet/vacuum ultraviolet (UV/VUV) photons, Ar+ ion bombardment and heating in the roughening of 193 nm photoresist have been investigated. Atomic force microscopy measurements show minimal surface roughness after UV/VUV-only or ion-only exposures at any temperature. Simultaneous UV/VUV, ion bombardment, and heating to surface temperatures of 60-100 °C result in increased surface roughness, and is comparable to argon plasma-exposed samples. Ion bombardment creates a modified near-surface layer while UV/VUV radiation results in loss of carbon-oxygen bonds up to a depth of ∼100 nm. Enhanced roughness is only observed in the presence of all three effects.

Original language	English (US)
Article number	153113
Journal	Applied Physics Letters
Volume	92
Issue number	15
DOIs	https://doi.org/10.1063/1.2912028
State	Published - 2008
Externally published	Yes

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.2912028

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@article{52f8ca55fb414851af3ad0fa87f5c356,

title = "Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193 nm photoresist roughening and degradation",

abstract = "The roles of ultraviolet/vacuum ultraviolet (UV/VUV) photons, Ar+ ion bombardment and heating in the roughening of 193 nm photoresist have been investigated. Atomic force microscopy measurements show minimal surface roughness after UV/VUV-only or ion-only exposures at any temperature. Simultaneous UV/VUV, ion bombardment, and heating to surface temperatures of 60-100 °C result in increased surface roughness, and is comparable to argon plasma-exposed samples. Ion bombardment creates a modified near-surface layer while UV/VUV radiation results in loss of carbon-oxygen bonds up to a depth of ∼100 nm. Enhanced roughness is only observed in the presence of all three effects.",

author = "D. Nest and Graves, {D. B.} and S. Engelmann and Bruce, {R. L.} and F. Weilnboeck and Oehrlein, {G. S.} and C. Andes and Hudson, {E. A.}",

note = "Funding Information: The authors gratefully acknowledge the thoughtful insights of J.W. Coburn, H.F. Winters and D. Fraser. R. Segalman was very helpful in discussions and with AFM measurements. We thank M. Wertheimer for his comments and suggestions and B. Bush for his assistance in SEM preparation. This work was supported by NSF DMR 0406120 and DMR 0705953. ",

year = "2008",

doi = "10.1063/1.2912028",

language = "English (US)",

volume = "92",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

number = "15",

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TY - JOUR

T1 - Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193 nm photoresist roughening and degradation

AU - Nest, D.

AU - Graves, D. B.

AU - Engelmann, S.

AU - Bruce, R. L.

AU - Weilnboeck, F.

AU - Oehrlein, G. S.

AU - Andes, C.

AU - Hudson, E. A.

N1 - Funding Information: The authors gratefully acknowledge the thoughtful insights of J.W. Coburn, H.F. Winters and D. Fraser. R. Segalman was very helpful in discussions and with AFM measurements. We thank M. Wertheimer for his comments and suggestions and B. Bush for his assistance in SEM preparation. This work was supported by NSF DMR 0406120 and DMR 0705953.

PY - 2008

Y1 - 2008

N2 - The roles of ultraviolet/vacuum ultraviolet (UV/VUV) photons, Ar+ ion bombardment and heating in the roughening of 193 nm photoresist have been investigated. Atomic force microscopy measurements show minimal surface roughness after UV/VUV-only or ion-only exposures at any temperature. Simultaneous UV/VUV, ion bombardment, and heating to surface temperatures of 60-100 °C result in increased surface roughness, and is comparable to argon plasma-exposed samples. Ion bombardment creates a modified near-surface layer while UV/VUV radiation results in loss of carbon-oxygen bonds up to a depth of ∼100 nm. Enhanced roughness is only observed in the presence of all three effects.

AB - The roles of ultraviolet/vacuum ultraviolet (UV/VUV) photons, Ar+ ion bombardment and heating in the roughening of 193 nm photoresist have been investigated. Atomic force microscopy measurements show minimal surface roughness after UV/VUV-only or ion-only exposures at any temperature. Simultaneous UV/VUV, ion bombardment, and heating to surface temperatures of 60-100 °C result in increased surface roughness, and is comparable to argon plasma-exposed samples. Ion bombardment creates a modified near-surface layer while UV/VUV radiation results in loss of carbon-oxygen bonds up to a depth of ∼100 nm. Enhanced roughness is only observed in the presence of all three effects.

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U2 - 10.1063/1.2912028

DO - 10.1063/1.2912028

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VL - 92

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 15

M1 - 153113

ER -

Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193 nm photoresist roughening and degradation

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