Synergistic damage effects of vacuum ultraviolet photons and O₂ in SiCOH ultra-low-k dielectric films

Engineering & Materials Science

• Low-k dielectric 100%
• Dielectric films 99%
• Photons 79%
• Vacuum 59%
• Plasmas 53%
• Ion bombardment 30%
• Permittivity 28%
• Dangling bonds 17%
• Ultraviolet lamps 16%
• Plasma applications 15%
• Beam plasma interactions 15%
• Surface reactions 13%
• Mass spectrometry 12%
• Fourier transform infrared spectroscopy 11%
• Water vapor 10%
• Adsorption 9%
• Heating 6%

Chemical Compounds

• Dielectric Film 98%
• Photon 64%
• Vacuum 53%
• Dielectric Constant 26%
• Ion Bombardment 25%
• Plasma 17%
• Dangling Bond 12%
• Silanol 10%
• Surface Reaction 10%
• Water Vapor 9%
• Dielectric Material 8%
• Mass Spectrometry 6%
• Porosity 5%
• Fourier Transform Infrared Spectroscopy 5%
• Adsorption 4%
• Liquid Film 4%

Physics & Astronomy

• damage 48%
• vacuum 42%
• photons 37%
• permittivity 20%
• surface reactions 19%
• bombardment 17%
• photon beams 10%
• attack 10%
• water vapor 9%
• mass spectroscopy 9%
• luminaires 9%
• ions 8%
• diffusivity 8%
• infrared spectroscopy 8%
• fluence 8%
• adsorption 7%
• atmospheres 6%
• heating 6%