Surface stability and atomic-step-edge kinetics on a cleaved-edge-overgrown (110) GaAs surface

Masahiro Yoshita, Hidefumi Akiyama, Loren N. Pfeiffer, Ken W. West

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We investigate the evolution of surface smoothness and atomic step-edge patterns on 6-nm (110) GaAs surfaces grown by cleaved-edge overgrowth with molecular beam epitaxy (MBE) and subsequent in situ annealing at elevated substrate temperatures ranging from 590 to 650°C. As the annealing temperature was increased, island structures of μm scale formed on the annealed surfaces decreased in size and almost disappeared at 630°C while pit structures and underlying monolayer terraces increased in size, which indicate that the surface migration of atoms are enhanced and flatten the (110) surface during annealing. At higher annealing temperatures above 630°C, new triangular-shaped pit structures appeared on the surface, which disturbs atomic-scale smoothing of the (110) surfaces.

Original languageEnglish (US)
Title of host publicationPhysics of Semiconductors - 28th International Conference on the Physics of Semiconductors, ICPS 2006, Part A and B
Pages85-86
Number of pages2
DOIs
StatePublished - 2007
Externally publishedYes
Event28th International Conference on the Physics of Semiconductors, ICPS 2006 - Vienna, Austria
Duration: Jul 24 2006Jul 28 2006

Publication series

NameAIP Conference Proceedings
Volume893
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Other

Other28th International Conference on the Physics of Semiconductors, ICPS 2006
Country/TerritoryAustria
CityVienna
Period7/24/067/28/06

All Science Journal Classification (ASJC) codes

  • General Physics and Astronomy

Keywords

  • (110) GaAs
  • Cleaved-edge overgrowth
  • MBE
  • Step-edge kinetics
  • Surface morphology

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