Summary Abstract: Precursor adsorption of oxygen on Si(111) at low temperatures

C. Silvestre; M. Shayeqan

doi:10.1116/1.575125

Summary Abstract: Precursor adsorption of oxygen on Si(111) at low temperatures

C. Silvestre
, M. Shayeqan

Research output: Contribution to journal › Article › peer-review

Original language	English (US)
Pages (from-to)	798-800
Number of pages	3
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	6
Issue number	3
DOIs	https://doi.org/10.1116/1.575125
State	Published - May 1988

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

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10.1116/1.575125

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title = "Summary Abstract: Precursor adsorption of oxygen on Si(111) at low temperatures",

author = "C. Silvestre and M. Shayeqan",

year = "1988",

month = may,

doi = "10.1116/1.575125",

language = "English (US)",

volume = "6",

pages = "798--800",

journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "3",

}

TY - JOUR

T1 - Summary Abstract

T2 - Precursor adsorption of oxygen on Si(111) at low temperatures

AU - Silvestre, C.

AU - Shayeqan, M.

PY - 1988/5

Y1 - 1988/5

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U2 - 10.1116/1.575125

DO - 10.1116/1.575125

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AN - SCOPUS:84927367788

SN - 0734-2101

VL - 6

SP - 798

EP - 800

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 3

ER -

Summary Abstract: Precursor adsorption of oxygen on Si(111) at low temperatures

All Science Journal Classification (ASJC) codes

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