Substrate bias and temperature dependence of anomalous subthreshold slopes in fully-depleted submicron SOI MOSFET's

K. Tokunaga, James Christopher Sturm, J. P. Colinge

Research output: Contribution to conferencePaper

2 Scopus citations

Abstract

Summary form only given. Anomalously sharp subthreshold slopes in fully depleted ultrathin SOI MOSFETs are discussed. The effect can be eliminated by control of the lower SOI interface charge condition. The temperature dependence of this effect is also discussed.

Original languageEnglish (US)
Pages15-16
Number of pages2
StatePublished - Dec 1 1989
EventIEEE SOS/SOI Technology Conference 1989 - Stateline, NV, USA
Duration: Oct 3 1989Oct 5 1989

Other

OtherIEEE SOS/SOI Technology Conference 1989
CityStateline, NV, USA
Period10/3/8910/5/89

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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    Tokunaga, K., Sturm, J. C., & Colinge, J. P. (1989). Substrate bias and temperature dependence of anomalous subthreshold slopes in fully-depleted submicron SOI MOSFET's. 15-16. Paper presented at IEEE SOS/SOI Technology Conference 1989, Stateline, NV, USA, .