Sub-micron patterning of rough surfaces using optical trap assisted nanopatterning

Romain Fardel, Yu Cheng Tsai, Craig B. Arnold

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Optical trap assisted nanopatterning is used to write sub-micron features on substrates with pre-existing topography. Uniform patterns are successfully written across a large-scale trench on a polyimide surface.

Original languageEnglish (US)
Title of host publicationOptical Trapping Applications, OTA 2011
StatePublished - Dec 1 2011
EventOptical Trapping Applications, OTA 2011 - Monterey, CA, United States
Duration: Apr 4 2011Apr 6 2011

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Other

OtherOptical Trapping Applications, OTA 2011
CountryUnited States
CityMonterey, CA
Period4/4/114/6/11

All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

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  • Cite this

    Fardel, R., Tsai, Y. C., & Arnold, C. B. (2011). Sub-micron patterning of rough surfaces using optical trap assisted nanopatterning. In Optical Trapping Applications, OTA 2011 (Optics InfoBase Conference Papers).