Sub-20-nm alignment in nanoimprint lithography using moiré fringe

Keyphrases

• Nanoimprint Lithography 100%
• Wafer 100%
• Sub-20 Nm 100%
• Grating 40%
• Single Point 40%
• Alignment Accuracy 40%
• Mismatch Compensation 40%
• Temperature Control 20%
• Error Distribution 20%
• Accuracy Error 20%
• Nanopositioning Stage 20%
• Point Alignment 20%
• Precise Temperature Control 20%
• Overlay Accuracy 20%
• Integrated Circuit Manufacturing 20%
• Overlay Alignment 20%

Engineering

• Nanoimprint Lithography 100%
• Moir Fringe 100%
• Accuracy-Error 33%
• Error Distribution 33%
• Nanopositioning Stage 33%
• Integrated Circuit 33%

Physics

• Lithography 100%
• Temperature Control 66%
• Integrated Circuit 33%