Abstract
We have discovered an alternate pathway below the usual 1.1 eV threshold for Si photoionization from the DX ground state in AlGaAs. This alternate photopath proceeds via a 0.1 eV wide resonance at 0.65 eV. The ionization rate for this path scales as the square of the resonance photon intensity, not linearly with the intensity as does the usual 1.1 eV threshold path. Photons at 0.5 eV accompanied by weak photon fluxes at 0.65 eV do scale linearly with 0.5 eV intensity showing the 0.65 eV state is a short-lived resonant intermediate level.
Original language | English (US) |
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Pages (from-to) | 1141-1148 |
Number of pages | 8 |
Journal | Materials Science Forum |
Volume | 143-4 |
Issue number | pt 2 |
State | Published - 1994 |
Externally published | Yes |
Event | Proceedings of the 17th International Conference on Defects in Semiconductors. Part 1 (of 3) - Gmunden, Austria Duration: Jul 18 1993 → Jul 23 1993 |
All Science Journal Classification (ASJC) codes
- General Materials Science
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering