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Structural inversion asymmetry in epitaxial ultrathin films of Bi(111)/InSb(111)B

  • Hadass S. Inbar
  • , Muhammad Zubair
  • , Jason T. Dong
  • , Aaron N. Engel
  • , Connor P. Dempsey
  • , Yu Hao Chang
  • , Shinichi Nishihaya
  • , Shoaib Khalid
  • , Alexei V. Fedorov
  • , Anderson Janotti
  • , Chris J. Palmstrøm

Research output: Contribution to journalArticlepeer-review

Abstract

Bismuth (Bi) films hold potential for spintronic devices due to strong spin-orbit coupling. Understanding the growth, surface states, and interactions with the substrate is key to their functionalization. Large-area high-quality (111) Bi ultrathin films were grown on InSb (111)B substrates by molecular beam epitaxy (MBE). Strong film-substrate interactions epitaxially stabilize the (111) orientation and lead to nonequivalent interface potentials. Analysis of angle-resolved photoemission spectroscopy (ARPES) measurements, employed to characterize the evolution of the surface states with film thickness, indicate a crossing at the M¯ point, suggesting a topologically trivial phase in the thin film. The results show the presence of interfacial bonds to the substrate breaks inversion symmetry, preventing the semimetal-to-semiconductor transition predicted for freestanding bismuth layers, highlighting the importance of controlled functionalization and surface passivation of two-dimensional materials.

Original languageEnglish (US)
Article number054202
JournalPhysical Review Materials
Volume9
Issue number5
DOIs
StatePublished - May 2025

All Science Journal Classification (ASJC) codes

  • General Materials Science
  • Physics and Astronomy (miscellaneous)

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