Skip to main navigation Skip to search Skip to main content

Spin relaxation in SiGe islands

  • H. Malissa
  • , W. Jantsch
  • , G. Chen
  • , H. Lichtenberger
  • , T. Fromherz
  • , F. Schäffler
  • , G. Bauer
  • , A. Tyryshkin
  • , S. Lyon
  • , Z. Wilamowski

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We investigate spin relaxation of electrons confined in SiGe structures produced by MBE growth of Ge islands on unstructured and structured Si substrates that cause strain in a Si layer above. These structures are investigated by photoluminescence spectroscopy and electron spin resonance both in continuous wave and pulsed mode. These structures show an ESR line-width and a g-factor of conduction electrons in Si with inhomogeneous broadening and no 2D anisotropy.

Original languageEnglish (US)
Title of host publicationPhysics of Semiconductors - 28th International Conference on the Physics of Semiconductors, ICPS 2006, Part A and B
Pages1317-1318
Number of pages2
DOIs
StatePublished - 2007
Event28th International Conference on the Physics of Semiconductors, ICPS 2006 - Vienna, Austria
Duration: Jul 24 2006Jul 28 2006

Publication series

NameAIP Conference Proceedings
Volume893
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Other

Other28th International Conference on the Physics of Semiconductors, ICPS 2006
Country/TerritoryAustria
CityVienna
Period7/24/067/28/06

All Science Journal Classification (ASJC) codes

  • General Physics and Astronomy

Keywords

  • Quantum dots
  • Spintronics

Fingerprint

Dive into the research topics of 'Spin relaxation in SiGe islands'. Together they form a unique fingerprint.

Cite this