Speed investigations toward an industrial application of optical trap assisted nanopatterning

Romain Fardel, Yu Cheng Tsai, Craig B. Arnold

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Optical trap assisted nanopatterning is a viable method of producing parallel nanoscale features over rough surfaces and large areas. The maximum writing speed on various surfaces is elucidated to evaluate the performance of the method.

Original languageEnglish (US)
Title of host publicationCLEO
Subtitle of host publicationApplications and Technology, CLEO_AT 2011
StatePublished - Dec 1 2011
EventCLEO: Applications and Technology, CLEO_AT 2011 - Baltimore, MD, United States
Duration: May 1 2011May 6 2011

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Other

OtherCLEO: Applications and Technology, CLEO_AT 2011
CountryUnited States
CityBaltimore, MD
Period5/1/115/6/11

All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

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  • Cite this

    Fardel, R., Tsai, Y. C., & Arnold, C. B. (2011). Speed investigations toward an industrial application of optical trap assisted nanopatterning. In CLEO: Applications and Technology, CLEO_AT 2011 (Optics InfoBase Conference Papers).