Speed investigations toward an industrial application of optical trap assisted nanopatterning

Romain Fardel, Yu Cheng Tsai, Craig B. Arnold

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Optical trap assisted nanopatterning is a viable method of producing parallel nanoscale features over rough surfaces and large areas. The maximum writing speed on various surfaces is elucidated to evaluate the performance of the method.

Original languageEnglish (US)
Title of host publication2011 Conference on Lasers and Electro-Optics
Subtitle of host publicationLaser Science to Photonic Applications, CLEO 2011
StatePublished - Sep 1 2011
Event2011 Conference on Lasers and Electro-Optics, CLEO 2011 - Baltimore, MD, United States
Duration: May 1 2011May 6 2011

Publication series

Name2011 Conference on Lasers and Electro-Optics: Laser Science to Photonic Applications, CLEO 2011

Other

Other2011 Conference on Lasers and Electro-Optics, CLEO 2011
CountryUnited States
CityBaltimore, MD
Period5/1/115/6/11

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics

Fingerprint Dive into the research topics of 'Speed investigations toward an industrial application of optical trap assisted nanopatterning'. Together they form a unique fingerprint.

  • Cite this

    Fardel, R., Tsai, Y. C., & Arnold, C. B. (2011). Speed investigations toward an industrial application of optical trap assisted nanopatterning. In 2011 Conference on Lasers and Electro-Optics: Laser Science to Photonic Applications, CLEO 2011 [5950025] (2011 Conference on Lasers and Electro-Optics: Laser Science to Photonic Applications, CLEO 2011).