Abstract
This paper reports the fabrication and characterization of unique silicon quantum-dot transistors (QDTs) that demonstrate quantum as well as single-electron Coulomb Blockade effects at temperatures above 100 K. They are also the first Si transistors that show interference between different modes of quantum waves in a cavity. The transistors were fabricated on SIMOX silicon wafer with the top silicon layer of 70 m thick. By studying the QDTs of different sizes on the same substrate, the effects of quantum dot size and construction size were investigated. The simulation tools based on various models were also developed to improve current understanding of the device operation.
Original language | English (US) |
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Pages | 48-49 |
Number of pages | 2 |
State | Published - 1995 |
Externally published | Yes |
Event | Proceedings of the 1995 53rd Annual Device Research Conference Digest - Charlottesville, VA, USA Duration: Jun 19 1995 → Jun 21 1995 |
Other
Other | Proceedings of the 1995 53rd Annual Device Research Conference Digest |
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City | Charlottesville, VA, USA |
Period | 6/19/95 → 6/21/95 |
All Science Journal Classification (ASJC) codes
- General Engineering