@inproceedings{60b9e44b9f7b4eb29e5be82e5d1e0d87,
title = "Silicon Nanogap Electrode Engineering for Organic Monolayer Field Effect Transistors",
abstract = "The fabrication and characterization of planar silicon nanogap electrode structures is described in which contact separation ≥ 30 nm was achieved. Starting from highly doped silicon-on-insulator substrates, fabrication is based on precise control of electron-beam lithography and subsequent reactive ion etching (etch rate 3.6 nm/s). A monolayer of an aromatic organophosphonate is then assembled in the etched nanogap. Conductance is greatly improved compared to a device absent the monolayer, and distinct field-effect induced modulation of the conductance is observed. Finite element simulations of the electrostatic potential distribution of the device structure supports its suitability as a three-terminal field effect device.",
author = "Simon Pfaehler and Anshuma Pathak and Liao, {Kung Ching} and Jeffrey Schwartz and Marc Tornow",
note = "Publisher Copyright: {\textcopyright} 2019 IEEE.; 19th IEEE International Conference on Nanotechnology, NANO 2019 ; Conference date: 22-07-2019 Through 26-07-2019",
year = "2019",
month = jul,
doi = "10.1109/NANO46743.2019.8993870",
language = "English (US)",
series = "Proceedings of the IEEE Conference on Nanotechnology",
publisher = "IEEE Computer Society",
pages = "521--525",
booktitle = "19th IEEE International Conference on Nanotechnology, NANO 2019",
address = "United States",
}