TY - JOUR
T1 - SiGe and CMOS Technology for State-of-the-Art Millimeter-Wave Transceivers
AU - Preez, Jaco Du
AU - Sinha, Saurabh
AU - Sengupta, Kaushik
N1 - Funding Information:
The work of Saurabh Sinha was supported by the U.S. Fulbright Program through the South African National Research Foundation (NRF) under Grant PS00332353.
Publisher Copyright:
© 2013 IEEE.
PY - 2023
Y1 - 2023
N2 - Innovation and evolution are paramount where the demand for wideband, data-intensive connectivity is ever-increasing, and the only constant is change. Standards that define the operation of next-generation mobile networks are moving away from the traditional radio frequency (RF) spectrum and into millimeter-wave (mm-wave) bands. The physical layer (PHY) for IEEE 802.11ad Wi-Fi and 802.11ay WLANs dictates operation in the unlicensed 60 GHz band. 5G New Radio (NR) applications utilize selected bands from 26 to 39 GHz. Additionally, newly developing Fourth Industrial Revolution (4IR) applications depend on 5G NR as an enabling technology. Satellite communications and wireless backhaul will occur in E-band between 70-86 GHz. Increasing demands from the market cause designers to push boundaries, and the development of standards guide technological advances. Perhaps the most substantial improvements are observed in integrated circuit technology. This article details the major Si processes, namely Complementary Metal Oxide Semiconductor (CMOS) and SiGe Bipolar CMOS (BiCMOS), and their foray into the wireless transceiver space traditionally dominated by GaAs. CMOS and BiCMOS have become popular in many communities because of their low fabrication cost and excellent digital integration capabilities. RF performance has matured to where Si is a serious competitor for tried-and-tested III-V technologies. Some extreme environments and sophisticated applications still favor GaAs and GaN, however. GaAs, for example, can yield unparalleled output power and excellent noise figure performance, albeit at a higher cost and increased design and manufacturing complexity due to the multi-chip nature of these circuits.
AB - Innovation and evolution are paramount where the demand for wideband, data-intensive connectivity is ever-increasing, and the only constant is change. Standards that define the operation of next-generation mobile networks are moving away from the traditional radio frequency (RF) spectrum and into millimeter-wave (mm-wave) bands. The physical layer (PHY) for IEEE 802.11ad Wi-Fi and 802.11ay WLANs dictates operation in the unlicensed 60 GHz band. 5G New Radio (NR) applications utilize selected bands from 26 to 39 GHz. Additionally, newly developing Fourth Industrial Revolution (4IR) applications depend on 5G NR as an enabling technology. Satellite communications and wireless backhaul will occur in E-band between 70-86 GHz. Increasing demands from the market cause designers to push boundaries, and the development of standards guide technological advances. Perhaps the most substantial improvements are observed in integrated circuit technology. This article details the major Si processes, namely Complementary Metal Oxide Semiconductor (CMOS) and SiGe Bipolar CMOS (BiCMOS), and their foray into the wireless transceiver space traditionally dominated by GaAs. CMOS and BiCMOS have become popular in many communities because of their low fabrication cost and excellent digital integration capabilities. RF performance has matured to where Si is a serious competitor for tried-and-tested III-V technologies. Some extreme environments and sophisticated applications still favor GaAs and GaN, however. GaAs, for example, can yield unparalleled output power and excellent noise figure performance, albeit at a higher cost and increased design and manufacturing complexity due to the multi-chip nature of these circuits.
KW - 5G new radio (NR)
KW - CMOS
KW - Internet of Things (IoT)
KW - SiGe BiCMOS
KW - broadband communication
KW - cellular vehicle-to-everything (C-V2X)
KW - fourth industrial revolution (4IR)
KW - millimeter-wave
UR - http://www.scopus.com/inward/record.url?scp=85161528873&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85161528873&partnerID=8YFLogxK
U2 - 10.1109/ACCESS.2023.3282693
DO - 10.1109/ACCESS.2023.3282693
M3 - Review article
AN - SCOPUS:85161528873
SN - 2169-3536
VL - 11
SP - 55596
EP - 55617
JO - IEEE Access
JF - IEEE Access
ER -