Secondary-ion mass spectrometry study of the migration of Si in planar-doped GaAs and Al0.25Ga0.75As

A. M. Lanzillotto, M. Santos, M. Shayegan

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We have investigated the effect of substrate temperature Ts during growth by molecular beam epitaxy on the migration of Si atoms in δ-(or planar) doped GaAs and Al0.25Ga0.75As using secondary-ion mass spectrometry (SIMS). Our results for δ-doped GaAs illustrate a measurable spread of Si that increases by ∼80 Å as T s is varied from 580 to 640°C. For comparable Ts, the Si spreads further (by ∼350 Å) in δ-doped Al 0.25Ga0.75As. For Ts<580°C, the width of the Si profiles is determined by the resolution of our SIMS measuring technique. Magnetotransport measurements were also performed on these structures in order to determine the spreading of the dopants. The Si migration measured by SIMS is in qualitative agreement with the transport results; however, the SIMS data indicate larger Si areal densities. Two mechanisms, autocompensation and the electron localization by a DX center, are believed to be responsible for the latter observation.

Original languageEnglish (US)
Pages (from-to)1445-1447
Number of pages3
JournalApplied Physics Letters
Issue number14
StatePublished - 1989

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)


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