Roller nanoimprint lithography

Hua Tan, Andrew Gilbertson, Stephen Y. Chou

Research output: Contribution to journalArticle

246 Scopus citations

Abstract

An alternative approach to flat nanoimprint lithography (NIL) - roller nanoimprint lithography (RNIL) is demonstrated. Compared with flat NIL, RNIL has the advantage of better uniformity less force and the ability to repeat a mask continuously on a large substrate. Two methods for RNIL are developed: (a) rolling a cylinder mold on a flat, solid substrate; (b) putting a flat mold directly on a substrate and rolling a smooth roller on top of the mold. Using our current roller nanoimprint system, sub-100 nm resolution pattern transfer has been achieved.

Original languageEnglish (US)
Pages (from-to)3926-3928
Number of pages3
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume16
Issue number6
StatePublished - Nov 1 1998

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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