Abstract
An alternative approach to flat nanoimprint lithography (NIL) - roller nanoimprint lithography (RNIL) is demonstrated. Compared with flat NIL, RNIL has the advantage of better uniformity less force and the ability to repeat a mask continuously on a large substrate. Two methods for RNIL are developed: (a) rolling a cylinder mold on a flat, solid substrate; (b) putting a flat mold directly on a substrate and rolling a smooth roller on top of the mold. Using our current roller nanoimprint system, sub-100 nm resolution pattern transfer has been achieved.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 3926-3928 |
| Number of pages | 3 |
| Journal | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
| Volume | 16 |
| Issue number | 6 |
| DOIs | |
| State | Published - 1998 |
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Electrical and Electronic Engineering