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Role of sidewall scattering in feature profile evolution during Cl2 and HBr plasma etching of silicon
M. A. Vyvoda, M. Li, D. B. Graves, H. Lee, M. V. Malyshev, F. P. Klemens, J. T.C. Lee, V. M. Donnelly
Research output: Contribution to journal › Article › peer-review
58
Scopus
citations