Role of polymer structure and ceiling temperature in polymer roughening and degradation during plasma processing: A beam system study of P4MS and PαMS

D. Nest, T. Y. Chung, J. J. Végh, D. B. Graves, R. L. Bruce, T. Lin, R. J. Phaneuf, G. S. Oehrlein, B. K. Long, C. G. Willson

Research output: Contribution to journal › Article › peer-review