Engineering & Materials Science
Chlorine
100%
Density (specific gravity)
99%
Polysilicon
94%
Etching
87%
Plasma density
65%
Surface chemistry
53%
Silicon
48%
Electron temperature
35%
Electrons
20%
Deposits
20%
Plasmas
18%
Ions
18%
Fluxes
16%
Gases
11%
Chemical Compounds
Etching
73%
Chlorine
71%
Surface Chemistry
49%
Elemental Silicon
45%
Electron Temperature
42%
Degree of Dissociation
37%
Plasma
33%
Residence Time
28%
Collision
27%
Surface
26%
Pressure
15%
Electron Particle
14%
Gas
14%
Ion
10%
Physics & Astronomy
chlorine
86%
etching
61%
products
52%
wafers
30%
plasma density
26%
chemistry
23%
silicon
21%
chambers
21%
deposits
12%
low pressure
11%
dissociation
11%
vapor phases
10%
electron energy
10%
collisions
8%
ions
6%
electrons
5%