Reflective polarizer based on a stacked double-layer subwavelength metal grating structure fabricated using nanoimprint lithography

Zhaoning Yu; Paru Deshpande; Wei Wu; Jian Wang; Stephen Y. Chou

doi:10.1063/1.1288674

Reflective polarizer based on a stacked double-layer subwavelength metal grating structure fabricated using nanoimprint lithography

Zhaoning Yu, Paru Deshpande, Wei Wu, Jian Wang, Stephen Y. Chou

Research output: Contribution to journal › Article › peer-review

145 Scopus citations

Abstract

A reflective polarizer consisting of two layers of 190 nm period metal gratings was fabricated using nanoimprint lithography. Measurements with a He-Ne laser (wavelength=632.8 nm) showed that at normal incidence, this polarizer reflects light polarized perpendicular to the grating lines (transverse magnetic polarization) with a reflectance of 54%, but strongly absorbs parallel-polarized light (transverse electric polarization) with a reflectance of only 0.25%. The enhanced polarization extinction ratio of over 200 at this wavelength is possibly related to the resonance between the two layers of metal gratings. This polarizer is thin, compact, and is suited for integrated optical systems.

Original language	English (US)
Pages (from-to)	927-929
Number of pages	3
Journal	Applied Physics Letters
Volume	77
Issue number	7
DOIs	https://doi.org/10.1063/1.1288674
State	Published - Aug 14 2000

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

Access to Document

10.1063/1.1288674

Cite this

@article{2931f1f472fd4110a40af2c50021b4a2,

title = "Reflective polarizer based on a stacked double-layer subwavelength metal grating structure fabricated using nanoimprint lithography",

abstract = "A reflective polarizer consisting of two layers of 190 nm period metal gratings was fabricated using nanoimprint lithography. Measurements with a He-Ne laser (wavelength=632.8 nm) showed that at normal incidence, this polarizer reflects light polarized perpendicular to the grating lines (transverse magnetic polarization) with a reflectance of 54%, but strongly absorbs parallel-polarized light (transverse electric polarization) with a reflectance of only 0.25%. The enhanced polarization extinction ratio of over 200 at this wavelength is possibly related to the resonance between the two layers of metal gratings. This polarizer is thin, compact, and is suited for integrated optical systems.",

author = "Zhaoning Yu and Paru Deshpande and Wei Wu and Jian Wang and Chou, {Stephen Y.}",

year = "2000",

month = aug,

day = "14",

doi = "10.1063/1.1288674",

language = "English (US)",

volume = "77",

pages = "927--929",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

number = "7",

}

TY - JOUR

T1 - Reflective polarizer based on a stacked double-layer subwavelength metal grating structure fabricated using nanoimprint lithography

AU - Yu, Zhaoning

AU - Deshpande, Paru

AU - Wu, Wei

AU - Wang, Jian

AU - Chou, Stephen Y.

PY - 2000/8/14

Y1 - 2000/8/14

N2 - A reflective polarizer consisting of two layers of 190 nm period metal gratings was fabricated using nanoimprint lithography. Measurements with a He-Ne laser (wavelength=632.8 nm) showed that at normal incidence, this polarizer reflects light polarized perpendicular to the grating lines (transverse magnetic polarization) with a reflectance of 54%, but strongly absorbs parallel-polarized light (transverse electric polarization) with a reflectance of only 0.25%. The enhanced polarization extinction ratio of over 200 at this wavelength is possibly related to the resonance between the two layers of metal gratings. This polarizer is thin, compact, and is suited for integrated optical systems.

AB - A reflective polarizer consisting of two layers of 190 nm period metal gratings was fabricated using nanoimprint lithography. Measurements with a He-Ne laser (wavelength=632.8 nm) showed that at normal incidence, this polarizer reflects light polarized perpendicular to the grating lines (transverse magnetic polarization) with a reflectance of 54%, but strongly absorbs parallel-polarized light (transverse electric polarization) with a reflectance of only 0.25%. The enhanced polarization extinction ratio of over 200 at this wavelength is possibly related to the resonance between the two layers of metal gratings. This polarizer is thin, compact, and is suited for integrated optical systems.

UR - http://www.scopus.com/inward/record.url?scp=0000249260&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0000249260&partnerID=8YFLogxK

U2 - 10.1063/1.1288674

DO - 10.1063/1.1288674

M3 - Article

AN - SCOPUS:0000249260

SN - 0003-6951

VL - 77

SP - 927

EP - 929

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 7

ER -

Reflective polarizer based on a stacked double-layer subwavelength metal grating structure fabricated using nanoimprint lithography

Abstract

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Fingerprint

Cite this