Abstract
We present real-time transmission electron microscopy of nanogap formation by feedback controlled electromigration that reveals a remarkable degree of crystalline order. Crystal facets appear during feedback controlled electromigration indicating a layer-by-layer, highly reproducible electromigration process avoiding thermal runaway and melting. These measurements provide insight into the electromigration induced failure mechanism in sub-20 nm size interconnects, indicating that the current density at failure increases as the width decreases to approximately 1 nm.
Original language | English (US) |
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Article number | 056805 |
Journal | Physical review letters |
Volume | 100 |
Issue number | 5 |
DOIs | |
State | Published - Feb 7 2008 |
All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)