Skip to main navigation
Skip to search
Skip to main content
Princeton University Home
Help & FAQ
Home
Profiles
Research units
Facilities
Projects
Research output
Press/Media
Search by expertise, name or affiliation
Reactor wall effects in Si-Cl
2
-Ar atomic layer etching
Joseph R. Vella
, Mahmoud A.I. Elgarhy
, Qinzhen Hao
, Vincent M. Donnelly
,
David B. Graves
Chemical & Biological Engineering
Research output
:
Contribution to journal
›
Article
›
peer-review
7
Scopus citations
Overview
Fingerprint
Fingerprint
Dive into the research topics of 'Reactor wall effects in Si-Cl
2
-Ar atomic layer etching'. Together they form a unique fingerprint.
Sort by
Weight
Alphabetically
Material Science
Density
25%
Desorption
25%
Emission Spectroscopy
100%
Silicon
50%
Surface (Surface Science)
50%
Chemical Engineering
Desorption
100%
Keyphrases
Plasma Nanotechnology
12%