Quantum wires and other novel structures by MBE overgrowth on the cleaved edges of multilayer substrates

Loren Pfeiffer, H. L. Stormer, Alejandro R. Goni, A. Pinczuk, K. W. Baldwin, K. W. West

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We review a new molecular beam epitaxy (MBE) technique we call cleaved edge overgrowth (CEO), which makes possible fabrication of quantum wires or other lower dimensional quantum structures with atomic precision. CEO is accomplished by performing two separate MBE overgrowths separated by an in situ cleave of the substrate sample. We review our development of this novel method and give three examples of new structures recently fabricated using it.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherPubl by Int Soc for Optical Engineering
Pages83-91
Number of pages9
ISBN (Print)0819408379
StatePublished - 1992
Externally publishedYes
EventAdvanced Semiconductor Epitaxial Growth Processes and Lateral and Vertical Fabrication - Somerset, NJ, USA
Duration: Mar 23 1992Mar 26 1992

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume1676
ISSN (Print)0277-786X

Conference

ConferenceAdvanced Semiconductor Epitaxial Growth Processes and Lateral and Vertical Fabrication
CitySomerset, NJ, USA
Period3/23/923/26/92

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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