Production and scaling of light impurities in TFTR plasmas

A. T. Ramsey; B. C. Stratton; P. P. Boody; C. E. Bush; H. F. Dylla; R. J. Fonck; D. W. Johnson; F. J. Stauffer

doi:10.1016/0022-3115(87)90405-3

Production and scaling of light impurities in TFTR plasmas

A. T. Ramsey, B. C. Stratton, P. P. Boody, C. E. Bush, H. F. Dylla, R. J. Fonck, D. W. Johnson, F. J. Stauffer

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Abstract

The important impurities in ohmically heated TFTR plasmas are carbon and oxygen. The concentration of O is independent of the mass or charge of the fuel gas; C is slightly less abundant in D plasmas than in He plasmas. C is more abundant than O by a factor of 10 at low densities (n_c ≅ 2 × 10¹⁹ m^-3); at the high density limit (n_e ≅ 4 × 10¹⁹ m-3 for H, n_e ≅ 8 × 10¹⁹ m-3 for He) the O concentration is equal to or slightly greater than that of C. The impurity concentration as a function of edge electron temperature is compared with a simple sputtering model, which shows the importance of C-C and O-C sputtering at the limiter in addition to fuel gas sputtering in explaining the observed carbon concentration.

Original language	English (US)
Pages (from-to)	592-595
Number of pages	4
Journal	Journal of Nuclear Materials
Volume	145-147
Issue number	C
DOIs	https://doi.org/10.1016/0022-3115(87)90405-3
State	Published - Feb 2 1987

All Science Journal Classification (ASJC) codes

Nuclear and High Energy Physics
General Materials Science
Nuclear Energy and Engineering

Keywords

impurities
plasma
TFTR

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10.1016/0022-3115(87)90405-3

Cite this

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title = "Production and scaling of light impurities in TFTR plasmas",

abstract = "The important impurities in ohmically heated TFTR plasmas are carbon and oxygen. The concentration of O is independent of the mass or charge of the fuel gas; C is slightly less abundant in D plasmas than in He plasmas. C is more abundant than O by a factor of 10 at low densities (nc ≅ 2 × 1019 m-3); at the high density limit (ne ≅ 4 × 1019 m-3 for H, ne ≅ 8 × 1019 m-3 for He) the O concentration is equal to or slightly greater than that of C. The impurity concentration as a function of edge electron temperature is compared with a simple sputtering model, which shows the importance of C-C and O-C sputtering at the limiter in addition to fuel gas sputtering in explaining the observed carbon concentration.",

keywords = "impurities, plasma, TFTR",

author = "Ramsey, \{A. T.\} and Stratton, \{B. C.\} and Boody, \{P. P.\} and Bush, \{C. E.\} and Dylla, \{H. F.\} and Fonck, \{R. J.\} and Johnson, \{D. W.\} and Stauffer, \{F. J.\}",

year = "1987",

month = feb,

day = "2",

doi = "10.1016/0022-3115(87)90405-3",

language = "English (US)",

volume = "145-147",

pages = "592--595",

journal = "Journal of Nuclear Materials",

issn = "0022-3115",

publisher = "Elsevier B.V.",

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TY - JOUR

T1 - Production and scaling of light impurities in TFTR plasmas

AU - Ramsey, A. T.

AU - Stratton, B. C.

AU - Boody, P. P.

AU - Bush, C. E.

AU - Dylla, H. F.

AU - Fonck, R. J.

AU - Johnson, D. W.

AU - Stauffer, F. J.

PY - 1987/2/2

Y1 - 1987/2/2

N2 - The important impurities in ohmically heated TFTR plasmas are carbon and oxygen. The concentration of O is independent of the mass or charge of the fuel gas; C is slightly less abundant in D plasmas than in He plasmas. C is more abundant than O by a factor of 10 at low densities (nc ≅ 2 × 1019 m-3); at the high density limit (ne ≅ 4 × 1019 m-3 for H, ne ≅ 8 × 1019 m-3 for He) the O concentration is equal to or slightly greater than that of C. The impurity concentration as a function of edge electron temperature is compared with a simple sputtering model, which shows the importance of C-C and O-C sputtering at the limiter in addition to fuel gas sputtering in explaining the observed carbon concentration.

AB - The important impurities in ohmically heated TFTR plasmas are carbon and oxygen. The concentration of O is independent of the mass or charge of the fuel gas; C is slightly less abundant in D plasmas than in He plasmas. C is more abundant than O by a factor of 10 at low densities (nc ≅ 2 × 1019 m-3); at the high density limit (ne ≅ 4 × 1019 m-3 for H, ne ≅ 8 × 1019 m-3 for He) the O concentration is equal to or slightly greater than that of C. The impurity concentration as a function of edge electron temperature is compared with a simple sputtering model, which shows the importance of C-C and O-C sputtering at the limiter in addition to fuel gas sputtering in explaining the observed carbon concentration.

KW - impurities

KW - plasma

KW - TFTR

UR - https://www.scopus.com/pages/publications/0023167082

UR - https://www.scopus.com/inward/citedby.url?scp=0023167082&partnerID=8YFLogxK

U2 - 10.1016/0022-3115(87)90405-3

DO - 10.1016/0022-3115(87)90405-3

M3 - Article

AN - SCOPUS:0023167082

SN - 0022-3115

VL - 145-147

SP - 592

EP - 595

JO - Journal of Nuclear Materials

JF - Journal of Nuclear Materials

IS - C

ER -

Production and scaling of light impurities in TFTR plasmas

Abstract

All Science Journal Classification (ASJC) codes

Keywords

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