Production and scaling of light impurities in TFTR plasmas

A. T. Ramsey; B. C. Stratton; P. P. Boody; C. E. Bush; H. F. Dylla; R. J. Fonck; D. W. Johnson; F. J. Stauffer

doi:10.1016/0022-3115(87)90405-3

Production and scaling of light impurities in TFTR plasmas

A. T. Ramsey
, B. C. Stratton
, P. P. Boody
, C. E. Bush
, H. F. Dylla
, R. J. Fonck
, D. W. Johnson
, F. J. Stauffer

PPPL NSTX

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

The important impurities in ohmically heated TFTR plasmas are carbon and oxygen. The concentration of O is independent of the mass or charge of the fuel gas; C is slightly less abundant in D plasmas than in He plasmas. C is more abundant than O by a factor of 10 at low densities (n_c ≅ 2 × 10¹⁹ m^-3); at the high density limit (n_e ≅ 4 × 10¹⁹ m-3 for H, n_e ≅ 8 × 10¹⁹ m-3 for He) the O concentration is equal to or slightly greater than that of C. The impurity concentration as a function of edge electron temperature is compared with a simple sputtering model, which shows the importance of C-C and O-C sputtering at the limiter in addition to fuel gas sputtering in explaining the observed carbon concentration.

Original language	English (US)
Pages (from-to)	592-595
Number of pages	4
Journal	Journal of Nuclear Materials
Volume	145-147
Issue number	C
DOIs	https://doi.org/10.1016/0022-3115(87)90405-3
State	Published - Feb 2 1987

All Science Journal Classification (ASJC) codes

Nuclear and High Energy Physics
General Materials Science
Nuclear Energy and Engineering

Keywords

impurities
plasma
TFTR

Access to Document

10.1016/0022-3115(87)90405-3

Cite this

@article{8b1d16c77ebd4e9bae3a906861ed0b41,

title = "Production and scaling of light impurities in TFTR plasmas",

abstract = "The important impurities in ohmically heated TFTR plasmas are carbon and oxygen. The concentration of O is independent of the mass or charge of the fuel gas; C is slightly less abundant in D plasmas than in He plasmas. C is more abundant than O by a factor of 10 at low densities (nc ≅ 2 × 1019 m-3); at the high density limit (ne ≅ 4 × 1019 m-3 for H, ne ≅ 8 × 1019 m-3 for He) the O concentration is equal to or slightly greater than that of C. The impurity concentration as a function of edge electron temperature is compared with a simple sputtering model, which shows the importance of C-C and O-C sputtering at the limiter in addition to fuel gas sputtering in explaining the observed carbon concentration.",

keywords = "impurities, plasma, TFTR",

author = "Ramsey, \{A. T.\} and Stratton, \{B. C.\} and Boody, \{P. P.\} and Bush, \{C. E.\} and Dylla, \{H. F.\} and Fonck, \{R. J.\} and Johnson, \{D. W.\} and Stauffer, \{F. J.\}",

year = "1987",

month = feb,

day = "2",

doi = "10.1016/0022-3115(87)90405-3",

language = "English (US)",

volume = "145-147",

pages = "592--595",

journal = "Journal of Nuclear Materials",

issn = "0022-3115",

publisher = "Elsevier B.V.",

number = "C",

}

TY - JOUR

T1 - Production and scaling of light impurities in TFTR plasmas

AU - Ramsey, A. T.

AU - Stratton, B. C.

AU - Boody, P. P.

AU - Bush, C. E.

AU - Dylla, H. F.

AU - Fonck, R. J.

AU - Johnson, D. W.

AU - Stauffer, F. J.

PY - 1987/2/2

Y1 - 1987/2/2

N2 - The important impurities in ohmically heated TFTR plasmas are carbon and oxygen. The concentration of O is independent of the mass or charge of the fuel gas; C is slightly less abundant in D plasmas than in He plasmas. C is more abundant than O by a factor of 10 at low densities (nc ≅ 2 × 1019 m-3); at the high density limit (ne ≅ 4 × 1019 m-3 for H, ne ≅ 8 × 1019 m-3 for He) the O concentration is equal to or slightly greater than that of C. The impurity concentration as a function of edge electron temperature is compared with a simple sputtering model, which shows the importance of C-C and O-C sputtering at the limiter in addition to fuel gas sputtering in explaining the observed carbon concentration.

AB - The important impurities in ohmically heated TFTR plasmas are carbon and oxygen. The concentration of O is independent of the mass or charge of the fuel gas; C is slightly less abundant in D plasmas than in He plasmas. C is more abundant than O by a factor of 10 at low densities (nc ≅ 2 × 1019 m-3); at the high density limit (ne ≅ 4 × 1019 m-3 for H, ne ≅ 8 × 1019 m-3 for He) the O concentration is equal to or slightly greater than that of C. The impurity concentration as a function of edge electron temperature is compared with a simple sputtering model, which shows the importance of C-C and O-C sputtering at the limiter in addition to fuel gas sputtering in explaining the observed carbon concentration.

KW - impurities

KW - plasma

KW - TFTR

UR - https://www.scopus.com/pages/publications/0023167082

UR - https://www.scopus.com/pages/publications/0023167082#tab=citedBy

U2 - 10.1016/0022-3115(87)90405-3

DO - 10.1016/0022-3115(87)90405-3

M3 - Article

AN - SCOPUS:0023167082

SN - 0022-3115

VL - 145-147

SP - 592

EP - 595

JO - Journal of Nuclear Materials

JF - Journal of Nuclear Materials

IS - C

ER -

Production and scaling of light impurities in TFTR plasmas

Abstract

All Science Journal Classification (ASJC) codes

Keywords

Access to Document

Other files and links

Fingerprint

Cite this