Abstract
Nano-graphene ribbons are promising in many electronic applications, as their bandgaps can be opened by reducing the widths, e.g.below 20nm. However, a high-throughput method to pattern large-area nano-graphene features is still not available. Here we report a fabrication method of sub-20nm ribbons on graphite stamps by nanoimprint lithography and a transfer-printing of the graphene ribbons to a Si wafer using electrostatic force assisted bonding. These methods provide a path for fast and high-throughput nano-graphene device production.
Original language | English (US) |
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Article number | 445301 |
Journal | Nanotechnology |
Volume | 22 |
Issue number | 44 |
DOIs | |
State | Published - Nov 4 2011 |
All Science Journal Classification (ASJC) codes
- General Chemistry
- Mechanics of Materials
- Mechanical Engineering
- Bioengineering
- Electrical and Electronic Engineering
- General Materials Science