Polarization dependence of light intensity distribution near a nanometric aluminum slit

Cheng Hung Wei; Pei Hsi Tsao; Wunshain Fann; Pei Kuen Wei; Jonas O. Tegenfeldt; Robert H. Austin

doi:10.1364/JOSAB.21.001005

Polarization dependence of light intensity distribution near a nanometric aluminum slit

Cheng Hung Wei, Pei Hsi Tsao, Wunshain Fann, Pei Kuen Wei, Jonas O. Tegenfeldt, Robert H. Austin

Research output: Contribution to journal › Article › peer-review

12 Scopus citations

Abstract

The near-field radiation pattern of a long thin slit (with a width much smaller than the excitation wavelength) in a uniform aluminum surface was measured and modeled by numerical computation. In particular, the interplay between the incident light polarization and the slit width is found to play an essential role in the near-field profile on the back side of the nanoslits. Two-dimensional finite-difference time-domain computer simulations were performed to calculate the near-field intensity profile for different slit widths and metal thicknesses. This method will allow the optimization of three-dimensional near-field radiation patterns for a variety of near-field molecular scanning schemes.

Original language	English (US)
Pages (from-to)	1005-1012
Number of pages	8
Journal	Journal of the Optical Society of America B: Optical Physics
Volume	21
Issue number	5
DOIs	https://doi.org/10.1364/JOSAB.21.001005
State	Published - May 2004

All Science Journal Classification (ASJC) codes

Statistical and Nonlinear Physics
Atomic and Molecular Physics, and Optics

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10.1364/JOSAB.21.001005

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title = "Polarization dependence of light intensity distribution near a nanometric aluminum slit",

abstract = "The near-field radiation pattern of a long thin slit (with a width much smaller than the excitation wavelength) in a uniform aluminum surface was measured and modeled by numerical computation. In particular, the interplay between the incident light polarization and the slit width is found to play an essential role in the near-field profile on the back side of the nanoslits. Two-dimensional finite-difference time-domain computer simulations were performed to calculate the near-field intensity profile for different slit widths and metal thicknesses. This method will allow the optimization of three-dimensional near-field radiation patterns for a variety of near-field molecular scanning schemes.",

author = "Wei, {Cheng Hung} and Tsao, {Pei Hsi} and Wunshain Fann and Wei, {Pei Kuen} and Tegenfeldt, {Jonas O.} and Austin, {Robert H.}",

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T1 - Polarization dependence of light intensity distribution near a nanometric aluminum slit

AU - Wei, Cheng Hung

AU - Tsao, Pei Hsi

AU - Fann, Wunshain

AU - Wei, Pei Kuen

AU - Tegenfeldt, Jonas O.

AU - Austin, Robert H.

PY - 2004/5

Y1 - 2004/5

N2 - The near-field radiation pattern of a long thin slit (with a width much smaller than the excitation wavelength) in a uniform aluminum surface was measured and modeled by numerical computation. In particular, the interplay between the incident light polarization and the slit width is found to play an essential role in the near-field profile on the back side of the nanoslits. Two-dimensional finite-difference time-domain computer simulations were performed to calculate the near-field intensity profile for different slit widths and metal thicknesses. This method will allow the optimization of three-dimensional near-field radiation patterns for a variety of near-field molecular scanning schemes.

AB - The near-field radiation pattern of a long thin slit (with a width much smaller than the excitation wavelength) in a uniform aluminum surface was measured and modeled by numerical computation. In particular, the interplay between the incident light polarization and the slit width is found to play an essential role in the near-field profile on the back side of the nanoslits. Two-dimensional finite-difference time-domain computer simulations were performed to calculate the near-field intensity profile for different slit widths and metal thicknesses. This method will allow the optimization of three-dimensional near-field radiation patterns for a variety of near-field molecular scanning schemes.

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JO - Journal of the Optical Society of America B: Optical Physics

JF - Journal of the Optical Society of America B: Optical Physics

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Polarization dependence of light intensity distribution near a nanometric aluminum slit

Abstract

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