Polarization dependence of light intensity distribution near a nanometric aluminum slit

Cheng Hung Wei, Pei Hsi Tsao, Wunshain Fann, Pei Kuen Wei, Jonas O. Tegenfeldt, Robert Hamilton Austin

Research output: Contribution to journalArticle

11 Scopus citations

Abstract

The near-field radiation pattern of a long thin slit (with a width much smaller than the excitation wavelength) in a uniform aluminum surface was measured and modeled by numerical computation. In particular, the interplay between the incident light polarization and the slit width is found to play an essential role in the near-field profile on the back side of the nanoslits. Two-dimensional finite-difference time-domain computer simulations were performed to calculate the near-field intensity profile for different slit widths and metal thicknesses. This method will allow the optimization of three-dimensional near-field radiation patterns for a variety of near-field molecular scanning schemes.

Original languageEnglish (US)
Pages (from-to)1005-1012
Number of pages8
JournalJournal of the Optical Society of America B: Optical Physics
Volume21
Issue number5
DOIs
StatePublished - Jan 1 2004

All Science Journal Classification (ASJC) codes

  • Statistical and Nonlinear Physics
  • Atomic and Molecular Physics, and Optics

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