Plasma uniformity in high-density inductively coupled plasma tools

R. A. Stewart, P. Vitello, D. B. Graves, E. F. Jaeger, L. A. Berry

Research output: Contribution to journalArticlepeer-review

102 Scopus citations

Abstract

A two-dimensional (r, z) fluid model is used to study plasma transport in inductively coupled plasmas (ICPS). Electron heating from external RF coil driven at 2 MHz is calculated self-consistently by solving for the time-averaged RF electric field. Radial plasma uniformity has been studied in both high (R/L=2.5) and low (R/L=1) aspect ratio ICP reactors driven with external planar or cylindrical coils. The effect of neutral gas pressure on plasma uniformity is presented for Ar discharges at 5 and 20 mTorr. The location of external coils and corresponding power deposition profile is predicted to have little effect on uniformity except at higher pressure (>or approximately= 20 mTorr) and for large aspect ratios. Planar coils appear superior to cylindrical coils for achieving relatively consistent uniformity over a wide range of pressures and reactor aspect ratios.

Original languageEnglish (US)
Article number005
Pages (from-to)36-46
Number of pages11
JournalPlasma Sources Science and Technology
Volume4
Issue number1
DOIs
StatePublished - 1995

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics

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