Plasma Treatment of Onychomycosis

Zilan Xiong; Jeffrey Roe; Timothy C. Grammer; David B. Graves

doi:10.1002/ppap.201600010

Plasma Treatment of Onychomycosis

Zilan Xiong, Jeffrey Roe, Timothy C. Grammer, David B. Graves

Research output: Contribution to journal › Article › peer-review

34 Scopus citations

Abstract

We report on the use of three “cold” atmospheric plasma (CAP) devices in treating model nails that have been coated on the backside of the nail with either Escherichia coli (E. coli) bacteria or Trichophyton rubrum (T. rubrum) fungus. We tested a helium plasma jet; a surface microdischarge plasma device; and a floating electrode dielectric barrier discharge. All of the devices, acting through the model nail, showed significant log reductions of bacterial and fungal targets in several tens of minutes. CAP technology appears to offer promise as a safe, effective, and inexpensive therapy for fungal nail infection treatment.

Original language	English (US)
Pages (from-to)	588-597
Number of pages	10
Journal	Plasma Processes and Polymers
Volume	13
Issue number	6
DOIs	https://doi.org/10.1002/ppap.201600010
State	Published - Jun 1 2016
Externally published	Yes

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Polymers and Plastics

Keywords

bacterial inactivation
fungal inactivation
non-thermal plasmas
onychomycosis

Access to Document

10.1002/ppap.201600010

Cite this

@article{2b6d5614da2a4b56b4d4004a58dd1ade,

title = "Plasma Treatment of Onychomycosis",

abstract = "We report on the use of three “cold” atmospheric plasma (CAP) devices in treating model nails that have been coated on the backside of the nail with either Escherichia coli (E. coli) bacteria or Trichophyton rubrum (T. rubrum) fungus. We tested a helium plasma jet; a surface microdischarge plasma device; and a floating electrode dielectric barrier discharge. All of the devices, acting through the model nail, showed significant log reductions of bacterial and fungal targets in several tens of minutes. CAP technology appears to offer promise as a safe, effective, and inexpensive therapy for fungal nail infection treatment.",

keywords = "bacterial inactivation, fungal inactivation, non-thermal plasmas, onychomycosis",

author = "Zilan Xiong and Jeffrey Roe and Grammer, {Timothy C.} and Graves, {David B.}",

note = "Publisher Copyright: {\textcopyright} 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim",

year = "2016",

month = jun,

day = "1",

doi = "10.1002/ppap.201600010",

language = "English (US)",

volume = "13",

pages = "588--597",

journal = "Plasma Processes and Polymers",

issn = "1612-8850",

publisher = "Wiley-VCH Verlag",

number = "6",

}

TY - JOUR

T1 - Plasma Treatment of Onychomycosis

AU - Xiong, Zilan

AU - Roe, Jeffrey

AU - Grammer, Timothy C.

AU - Graves, David B.

PY - 2016/6/1

Y1 - 2016/6/1

N2 - We report on the use of three “cold” atmospheric plasma (CAP) devices in treating model nails that have been coated on the backside of the nail with either Escherichia coli (E. coli) bacteria or Trichophyton rubrum (T. rubrum) fungus. We tested a helium plasma jet; a surface microdischarge plasma device; and a floating electrode dielectric barrier discharge. All of the devices, acting through the model nail, showed significant log reductions of bacterial and fungal targets in several tens of minutes. CAP technology appears to offer promise as a safe, effective, and inexpensive therapy for fungal nail infection treatment.

AB - We report on the use of three “cold” atmospheric plasma (CAP) devices in treating model nails that have been coated on the backside of the nail with either Escherichia coli (E. coli) bacteria or Trichophyton rubrum (T. rubrum) fungus. We tested a helium plasma jet; a surface microdischarge plasma device; and a floating electrode dielectric barrier discharge. All of the devices, acting through the model nail, showed significant log reductions of bacterial and fungal targets in several tens of minutes. CAP technology appears to offer promise as a safe, effective, and inexpensive therapy for fungal nail infection treatment.

KW - bacterial inactivation

KW - fungal inactivation

KW - non-thermal plasmas

KW - onychomycosis

UR - http://www.scopus.com/inward/record.url?scp=84979723578&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84979723578&partnerID=8YFLogxK

U2 - 10.1002/ppap.201600010

DO - 10.1002/ppap.201600010

M3 - Article

AN - SCOPUS:84979723578

SN - 1612-8850

VL - 13

SP - 588

EP - 597

JO - Plasma Processes and Polymers

JF - Plasma Processes and Polymers

IS - 6

ER -

Plasma Treatment of Onychomycosis

Abstract

All Science Journal Classification (ASJC) codes

Keywords

Access to Document

Other files and links

Fingerprint

Cite this