Plasma-surface interactions of advanced photoresists with C4 F8 Ar discharges: Plasma parameter dependencies
- S. Engelmann
- , R. L. Bruce
- , M. Sumiya
- , T. Kwon
- , R. Phaneuf
- , G. S. Oehrlein
- , C. Andes
- , D. Graves
- , D. Nest
- , E. A. Hudson
Research output: Contribution to journal › Article › peer-review
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