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Plasma-surface interactions of advanced photoresists with C4 F8 Ar discharges: Plasma parameter dependencies
S. Engelmann, R. L. Bruce, M. Sumiya, T. Kwon, R. Phaneuf, G. S. Oehrlein, C. Andes, D. Graves, D. Nest, E. A. Hudson
Research output: Contribution to journal › Article › peer-review
22
Scopus
citations