Plasma sources for advanced semiconductor applications

Oscar Versolato, Igor Kaganovich, Kallol Bera, Thorsten Lill, Hyo Chang Lee, Ronnie Hoekstra, John Sheil, Sang Ki Nam

Research output: Contribution to journalEditorialpeer-review

7 Scopus citations
Original languageEnglish (US)
Article number230401
JournalApplied Physics Letters
Volume125
Issue number23
DOIs
StatePublished - Dec 2 2024

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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