Plasma sources for advanced semiconductor applications

Oscar Versolato; Igor Kaganovich; Kallol Bera; Thorsten Lill; Hyo Chang Lee; Ronnie Hoekstra; John Sheil; Sang Ki Nam

doi:10.1063/5.0247819

Plasma sources for advanced semiconductor applications

Oscar Versolato
, Igor Kaganovich
, Kallol Bera
, Thorsten Lill
, Hyo Chang Lee
, Ronnie Hoekstra
, John Sheil
, Sang Ki Nam

Plasma Physics Lab

Research output: Contribution to journal › Editorial › peer-review

12 Scopus citations

Original language	English (US)
Article number	230401
Journal	Applied Physics Letters
Volume	125
Issue number	23
DOIs	https://doi.org/10.1063/5.0247819
State	Published - Dec 2 2024

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/5.0247819

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@article{351784f6fb454769a6400375e7b42939,

title = "Plasma sources for advanced semiconductor applications",

author = "Oscar Versolato and Igor Kaganovich and Kallol Bera and Thorsten Lill and Lee, \{Hyo Chang\} and Ronnie Hoekstra and John Sheil and Nam, \{Sang Ki\}",

year = "2024",

month = dec,

day = "2",

doi = "10.1063/5.0247819",

language = "English (US)",

volume = "125",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "23",

}

TY - JOUR

T1 - Plasma sources for advanced semiconductor applications

AU - Versolato, Oscar

AU - Kaganovich, Igor

AU - Bera, Kallol

AU - Lill, Thorsten

AU - Lee, Hyo Chang

AU - Hoekstra, Ronnie

AU - Sheil, John

AU - Nam, Sang Ki

PY - 2024/12/2

Y1 - 2024/12/2

UR - https://www.scopus.com/pages/publications/85211356550

UR - https://www.scopus.com/pages/publications/85211356550#tab=citedBy

U2 - 10.1063/5.0247819

DO - 10.1063/5.0247819

M3 - Editorial

AN - SCOPUS:85211356550

SN - 0003-6951

VL - 125

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 23

M1 - 230401

ER -

Plasma sources for advanced semiconductor applications

All Science Journal Classification (ASJC) codes

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