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Plasma-polymer interactions: A review of progress in understanding polymer resist mask durability during plasma etching for nanoscale fabrication
Gottlieb S. Oehrlein
, Raymond J. Phaneuf
,
David B. Graves
Research output
:
Contribution to journal
›
Review article
›
peer-review
150
Scopus citations
Overview
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Dive into the research topics of 'Plasma-polymer interactions: A review of progress in understanding polymer resist mask durability during plasma etching for nanoscale fabrication'. Together they form a unique fingerprint.
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Material Science
Surface Roughness
100%
Plasma Etching
100%
Ion Implantation
42%
Polymer Structure
42%
Film
28%
Polystyrene
28%
Nanocrystalline Material
14%
Morphology
14%
Self Assembly
14%
Block Copolymer
14%
Surface Property
14%
Molecular Structure
14%
Lithography
14%
Keyphrases
Resist Mask
100%
Polymer Resist
100%
Plasma-polymer Interactions
100%
Vacuum Ultraviolet Irradiation
28%
Polymer Modification
28%
Modified Layer
14%
Image Transfer
14%
Polystyrene Polymers
14%
Modified Surface Layer
14%
Near-surface Properties
14%
Engineering
Plasma Polymer
100%
Specific Polymer Structures
25%