Plasma characterization of tetra™ III chrome etch system

Michael Grimbergen, D. G. Nest, Keven Yu, T. Y. Becky Leung, Madhavi Chandrachood, Alan Ouye, Saravjeet Singh, Ibrahim Ibrahim, Ajay Kumar, David Graves

Research output: Chapter in Book/Report/Conference proceedingConference contribution


Both Langmuir probe and spatial optical emission spectroscopy (OES) measurements have been used to characterize the Tetra™ chrome etch chamber. Langmuir data was measured over a range of process pressures between 1.5mT and 10mT and source powers between 150W and 500W. At 350W, the data show electron and ion densities near 1 × 109 cm-3 for Ar and for Cl2/O2 etch plasmas. Ion density trends with pressure were observed to be opposite for the two plasmas. The effect of the third electrode designed in the chamber was demonstrated to reduce ion density by more than an order of magnitude for Ar plasma and still lower for Cl 2/O2 plasma. Electron temperature and plasma potential are also reduced. Radial OES measurements are reported with a new apparatus that yields direct spatial emission data. Spatial scans of infrared emission from atomic Cl were measured under a range of several chamber conditions already measured with the Langmuir probe. The scans showed that the emission uniformity above the mask can be adjusted to a flat profile by selection of the process condition.

Original languageEnglish (US)
Title of host publicationPhotomask Technology 2009
StatePublished - 2009
Externally publishedYes
EventPhotomask Technology 2009 - Monterey, CA, United States
Duration: Sep 14 2009Sep 17 2009

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X


ConferencePhotomask Technology 2009
Country/TerritoryUnited States
CityMonterey, CA

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


  • Chamber characterization
  • Plasma characterization
  • Plasma emission
  • Spectrum analysis


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