Planarization of spin-coated films

Loni M. Peurrung; David B. Graves

doi:10.1117/12.130353

Planarization of spin-coated films

Loni M. Peurrung, David B. Graves

Research output: Contribution to journal › Conference article › peer-review

5 Scopus citations

Abstract

To measure film thickness profiles over substrates with surface topography in situ during spin coating, we use a pulsed laser, a microsfcope, and a 35-mm camera to stroboscopically create and image interference fringes. The measured film thickness profiles are compared to predictions from a model of the coating flow which accounts for centrifugal, capillary, and viscous forces. This model has been extended to include both radial and azimuthal variations so that the surface contours around fully three-dimensional features may be calculated. Profile asymmetry in the radial direction, known as "pile-up", is caused by surface tension forces near the edges of the feature that accelerate flow where the channel (the film thickness) narrows and retard flow where the film thickness widens.

Original language	English (US)
Pages (from-to)	578-584
Number of pages	7
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	1674
DOIs	https://doi.org/10.1117/12.130353
State	Published - Jun 1 1992
Externally published	Yes
Event	Optical/Laser Microlithography V, MICROLITHOGRAPHY 1992 - San Jose, United States Duration: Mar 8 1992 → Mar 12 1992

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.130353

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title = "Planarization of spin-coated films",

abstract = "To measure film thickness profiles over substrates with surface topography in situ during spin coating, we use a pulsed laser, a microsfcope, and a 35-mm camera to stroboscopically create and image interference fringes. The measured film thickness profiles are compared to predictions from a model of the coating flow which accounts for centrifugal, capillary, and viscous forces. This model has been extended to include both radial and azimuthal variations so that the surface contours around fully three-dimensional features may be calculated. Profile asymmetry in the radial direction, known as {"}pile-up{"}, is caused by surface tension forces near the edges of the feature that accelerate flow where the channel (the film thickness) narrows and retard flow where the film thickness widens.",

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AU - Peurrung, Loni M.

AU - Graves, David B.

PY - 1992/6/1

Y1 - 1992/6/1

N2 - To measure film thickness profiles over substrates with surface topography in situ during spin coating, we use a pulsed laser, a microsfcope, and a 35-mm camera to stroboscopically create and image interference fringes. The measured film thickness profiles are compared to predictions from a model of the coating flow which accounts for centrifugal, capillary, and viscous forces. This model has been extended to include both radial and azimuthal variations so that the surface contours around fully three-dimensional features may be calculated. Profile asymmetry in the radial direction, known as "pile-up", is caused by surface tension forces near the edges of the feature that accelerate flow where the channel (the film thickness) narrows and retard flow where the film thickness widens.

AB - To measure film thickness profiles over substrates with surface topography in situ during spin coating, we use a pulsed laser, a microsfcope, and a 35-mm camera to stroboscopically create and image interference fringes. The measured film thickness profiles are compared to predictions from a model of the coating flow which accounts for centrifugal, capillary, and viscous forces. This model has been extended to include both radial and azimuthal variations so that the surface contours around fully three-dimensional features may be calculated. Profile asymmetry in the radial direction, known as "pile-up", is caused by surface tension forces near the edges of the feature that accelerate flow where the channel (the film thickness) narrows and retard flow where the film thickness widens.

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DO - 10.1117/12.130353

M3 - Conference article

AN - SCOPUS:20444381931

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VL - 1674

SP - 578

EP - 584

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Optical/Laser Microlithography V, MICROLITHOGRAPHY 1992

Y2 - 8 March 1992 through 12 March 1992

ER -

Planarization of spin-coated films

Abstract

All Science Journal Classification (ASJC) codes

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