Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry

F. Weilnboeck, R. L. Bruce, S. Engelmann, G. S. Oehrlein, D. Nest, T. Y. Chung, D. Graves, M. Li, D. Wang, C. Andes, E. A. Hudson

Research output: Contribution to journal › Article › peer-review