Patterning nano-square arrays using shear-aligned block copolymer thin films

S. Y. Kim, R. L. Davis, B. T. Michal, J. Gwyther, I. Manners, P. M. Chaikin, Richard Alan Register

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish (US)
Title of host publicationEngineering Sciences and Fundamentals 2013 - Core Programming Area at the 2013 AIChE Annual Meeting
Subtitle of host publicationGlobal Challenges for Engineering a Sustainable Future
PublisherAIChE
Pages605-607
Number of pages3
ISBN (Electronic)9781634390392
StatePublished - Jan 1 2013
EventEngineering Sciences and Fundamentals 2013 - Core Programming Area at the 2013 AIChE Annual Meeting: Global Challenges for Engineering a Sustainable Future - San Francisco, United States
Duration: Nov 3 2013Nov 8 2013

Publication series

NameEngineering Sciences and Fundamentals 2013 - Core Programming Area at the 2013 AIChE Annual Meeting: Global Challenges for Engineering a Sustainable Future
Volume2

Other

OtherEngineering Sciences and Fundamentals 2013 - Core Programming Area at the 2013 AIChE Annual Meeting: Global Challenges for Engineering a Sustainable Future
CountryUnited States
CitySan Francisco
Period11/3/1311/8/13

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Chemical Engineering(all)

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  • Cite this

    Kim, S. Y., Davis, R. L., Michal, B. T., Gwyther, J., Manners, I., Chaikin, P. M., & Register, R. A. (2013). Patterning nano-square arrays using shear-aligned block copolymer thin films. In Engineering Sciences and Fundamentals 2013 - Core Programming Area at the 2013 AIChE Annual Meeting: Global Challenges for Engineering a Sustainable Future (pp. 605-607). (Engineering Sciences and Fundamentals 2013 - Core Programming Area at the 2013 AIChE Annual Meeting: Global Challenges for Engineering a Sustainable Future; Vol. 2). AIChE.