Abstract
A method of large-area dye diffusion for patterning the emissive color of organic light-emitting devices (OLEDs) using transferred photoresist is introduced. Using a large-area dye diffusion source, the dye is diffused into the emissive layer of the OLED. To locally pattern the emissive color, either a shadow mask or a patterned dye source has to be used. The implementation of both approaches using photolithographic patterning and transferred photoresist is outlined in this paper. In addition, a method using transferred photoresist for patterning of the cathode will be discussed.
Original language | English (US) |
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Pages (from-to) | 59-68 |
Number of pages | 10 |
Journal | Proceedings of SPIE - The International Society for Optical Engineering |
Volume | 4105 |
DOIs | |
State | Published - 2001 |
Event | Organic LIght-Emitting Materials and Devices IV - San Diego, CA, United States Duration: Jul 31 2000 → Aug 2 2000 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Applied Mathematics
- Electrical and Electronic Engineering
- Computer Science Applications