Patterned dye diffusion using transferred photoresist for polymer OLED displays

F. Pschenitzka, James Christopher Sturm

Research output: Contribution to journalArticle

6 Scopus citations

Abstract

A method of large-area dye diffusion for patterning the emissive color of organic light-emitting devices (OLEDs) using transferred photoresist is introduced. Using a large-area dye diffusion source, the dye is diffused into the emissive layer of the OLED. To locally pattern the emissive color, either a shadow mask or a patterned dye source has to be used. The implementation of both approaches using photolithographic patterning and transferred photoresist is outlined in this paper. In addition, a method using transferred photoresist for patterning of the cathode will be discussed.

Original languageEnglish (US)
Pages (from-to)59-68
Number of pages10
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume4105
DOIs
StatePublished - Jan 1 2001

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

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