A method of large-area dye diffusion for patterning the emissive color of organic light-emitting devices (OLEDs) using transferred photoresist is introduced. Using a large-area dye diffusion source, the dye is diffused into the emissive layer of the OLED. To locally pattern the emissive color, either a shadow mask or a patterned dye source has to be used. The implementation of both approaches using photolithographic patterning and transferred photoresist is outlined in this paper. In addition, a method using transferred photoresist for patterning of the cathode will be discussed.
|Original language||English (US)|
|Number of pages||10|
|Journal||Proceedings of SPIE - The International Society for Optical Engineering|
|State||Published - Jan 1 2001|
All Science Journal Classification (ASJC) codes
- Electrical and Electronic Engineering
- Condensed Matter Physics